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Beam effects in Auger electron spectroscopy analysis of titanium oxide films

โœ Scribed by Mathieu, H. J.


Book ID
121668692
Publisher
AVS (American Vacuum Society)
Year
1977
Weight
741 KB
Volume
14
Category
Article
ISSN
0022-5355

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The advantages of ion etching over wet chemical etching are demonstrated, e,g. structure resolution in the region of the etching depth, no undercutting, excellent reproducibility and high adherence of small striplines.