✦ LIBER ✦

Automatic generation of phase shift mask layouts

✍ Scribed by T. Waas; H. Eisenmann; H. Hartmann; W. Henke

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Automatic generation of phase-shifting m

✍ E. Tamechika; T. Watanabe; K. Komatsu 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 266 KB

New concept for applying edge line phase

✍ M. Weiß; W. Henke 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 866 KB

Optimal phase conflict removal for layou

✍ Berman, P.; Kahng, A.B.; Vidhani, D.; Huijuan Wang; Zelikovsky, A. 📂 Article 📅 2000 🏛 IEEE 🌐 English ⚖ 319 KB

Generalized inverse lithography methods

✍ Ma, Xu; Arce, Gonzalo R. 📂 Article 📅 2007 🏛 Optical Society of America 🌐 English ⚖ 217 KB

Investigation of phase shift mask distor

✍ Jinglei Du; Zheng Cui; XiaoCong Yuan; Yongkang Guo 📂 Article 📅 2002 🏛 Elsevier Science 🌐 English ⚖ 300 KB

Mask topography effects in projection pr

✍ Wong, A.K.; Neureuther, A.R. 📂 Article 📅 1994 🏛 IEEE 🌐 English ⚖ 930 KB