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Atomistic nitriding processes of titanium thin films due to nitrogen-implantation

✍ Scribed by Y. Kasukabe; S. Nishida; S. Yamamoto; M. Yoshikawa; Y. Fujino


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
849 KB
Volume
254
Category
Article
ISSN
0169-4332

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Nitriding treatments using various (Ar-N 2 -H 2 ) gas mixtures are performed on thin molybdenum films coated on Si (100) substrates, in an expanding microwave plasma reactor. The electron density measured in (Ar-25%N 2 -30%H 2 ) and (Ar-8%N 2 -10%H 2 ) plasma as well as the electron energy distribut