High temperatures stability of plasma-enhanced chemically vapour deposited titanium silicide due to two-step rapid thermal annealing: Tohru Hara et al,Thin Solid Films,157, 1988, 135–142

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 153 KB
• Volume: 39
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(89)90812-9