High temperature stability of plasma-enhanced chemically vapour deposited titanium silicide due to two-step rapid thermal annealing

✍ Scribed by Tohru Hara; Yoshiro Ishizawa; Diederik G. Hemmes; Richard S. Rosler

• Publisher: Elsevier Science
• Year: 1988
• Tongue: English
• Weight: 421 KB
• Volume: 157
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(88)90354-9