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Atomistic mechanism of the initial oxidation of the clean Si(100)-(2×1) surface by O[sub 2] and SiO[sub 2] decomposition

✍ Scribed by Widjaja, Yuniarto; Musgrave, Charles B.


Book ID
111676478
Publisher
American Institute of Physics
Year
2002
Tongue
English
Weight
774 KB
Volume
116
Category
Article
ISSN
0021-9606

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