Atomic Layer Deposition of Tungsten(III) Oxide Thin Films from W 2 (NMe 2 ) 6 and Water: Precursor-Based Control of Oxidation State in the Thin Film Material

✍ Scribed by Dezelah, ; El-Kadri, Oussama M.; Szilágyi, Imre M.; Campbell, Joseph M.; Arstila, Kai; Niinistö, Lauri; Winter, Charles H.

• Book ID: 127255443
• Publisher: American Chemical Society
• Year: 2006
• Tongue: English
• Weight: 35 KB
• Volume: 128
• Category: Article
• ISSN: 0002-7863
• DOI: 10.1021/ja063272w