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Atomic Layer Deposition of Noble Metals and Their Oxides

✍ Scribed by Hämäläinen, Jani; Ritala, Mikko; Leskelä, Markku

Book ID
121804932
Publisher
American Chemical Society
Year
2013
Tongue
English
Weight
731 KB
Volume
26
Category
Article
ISSN
0897-4756

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Atomic Layer Deposition of High-k Oxides
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✍ Jaakko Niinistö; Kaupo Kukli; Mikko Heikkilä; Mikko Ritala; Markku Leskelä 📂 Article 📅 2009 🏛 John Wiley and Sons 🌐 English ⚖ 995 KB

## Abstract This paper reviews several high‐k ALD processes potentially applicable to the production of capacitors, concentrating on very recent developments. A list of the dielectric materials under investigation consists of the oxides of several metals, including the Group 4 (Ti, Zr, Hf) elements