Atomic Layer Deposition of NiO Films on Si(100) Using Cyclopentadienyl-Type Compounds and Ozone as Precursors

✍ Scribed by Lu, H. L.; Scarel, G.; Wiemer, C.; Perego, M.; Spiga, S.; Fanciulli, M.; Pavia, G.

• Book ID: 126887073
• Publisher: The Electrochemical Society
• Year: 2008
• Tongue: English
• Weight: 970 KB
• Volume: 155
• Category: Article
• ISSN: 0013-4651
• DOI: 10.1149/1.2965456