𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Atomic Layer Deposition of Metal Tellurides and Selenides Using Alkylsilyl Compounds of Tellurium and Selenium

✍ Scribed by Pore, Viljami; Hatanpää, Timo; Ritala, Mikko; Leskelä, Markku


Book ID
127127354
Publisher
American Chemical Society
Year
2009
Tongue
English
Weight
397 KB
Volume
131
Category
Article
ISSN
0002-7863

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Atomic Layer Deposition of Hafnium and Z
✍ Hausmann, Dennis M.; Kim, Esther; Becker, Jill; Gordon, Roy G. 📂 Article 📅 2002 🏛 American Chemical Society 🌐 English ⚖ 248 KB

Atomic layer deposition (ALD) of smooth and highly conformal films of hafnium and zirconium oxides was studied using six metal alkylamide precursors for hafnium and zirconium. Water was used as an oxygen source during these experiments. As deposited, these films exhibited a smooth surface with a mea

Investigations of titanium nitride as me
✍ F. Fillot; T. Morel; S. Minoret; I. Matko; S. Maîtrejean; B. Guillaumot; B. Chen 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 196 KB

This study reports for the first time, the evaluation of the work function and thermal stability of TiN gate material for deep sub-micron CMOS, elaborated by using metal organic atomic layer deposition, from TDMAT and NH 3 precursors. Composition, microstructure and electrical properties of atomic l