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Atomic Layer Deposition of Al-doped ZnO Films Using Aluminum Isopropoxide as the Al Precursor

✍ Scribed by Qian, Xu; Cao, Yanqiang; Guo, Binglei; Zhai, Haifa; Li, Aidong

Book ID: 120642174
Publisher: John Wiley and Sons
Year: 2013
Tongue: English
Weight: 455 KB
Volume: 19
Category: Article
ISSN: 0948-1907
DOI: 10.1002/cvde.201207051

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