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Atomic defects and stresses in r.f.-sputtered SiO2 thin films

โœ Scribed by A.L. Shabalov; M.S. Feldman

Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
401 KB
Volume
143
Category
Article
ISSN
0040-6090

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XRR and XPS studies of SiO2 thin films formed by r.f. magnetron sputtering
โœ Kojima, Isao; Li, Boquan; Fujimoto, Toshiyuki ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 136 KB ๐Ÿ‘ 2 views

Grazing-incidence x-ray reflectivity has been exploited to study as-grown SiO 2 thin films deposited on Si(100) substrates by radio-frequency (r.f.) magnetron sputtering under various substrate temperatures and gas flow conditions. Results indicate that an increase of substrate temperature from room