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Atmospheric-Pressure PECVD Coating and Plasma Chemical Etching for Continuous Processing

✍ Scribed by Hopfe, Volkmar; Sheel, David W.


Book ID
118195010
Publisher
IEEE
Year
2007
Tongue
English
Weight
756 KB
Volume
35
Category
Article
ISSN
0093-3813

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## Abstract In order to establish economic coating technologies for mass‐produced materials, the widely used, microwave plasma‐enhanced (PE) CVD technology has been extended to atmospheric pressure operation. Microwave plasma activation substantially widens the range of potential applications compa