PECVD and plasma etching at atmospheric pressure by means of a linearly-extended DC arc plasma source

✍ Scribed by Ines Dani; Volkmar Hopfe; Daniela Rogler; Elena Lopez; Gerrit Mäder

• Book ID: 111702338
• Publisher: John Wiley and Sons
• Year: 2007
• Tongue: English
• Weight: 209 KB
• Volume: 19
• Category: Article
• ISSN: 0947-076X
• DOI: 10.1002/vipr.200790035