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Atmospheric-Pressure Chemical Vapor Deposition of Group IVb Metal Phosphide Thin Films from Tetrakisdimethylamidometal Complexes and Cyclohexylphosphine

✍ Scribed by Blackman, Christopher S.; Carmalt, Claire J.; O'Neill, Shane A.; Parkin, Ivan P.; Apostolico, Leonardo; Molloy, Kieran C.

No coin nor oath required. For personal study only.

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