𝔖 Bobbio Scriptorium

✦ LIBER ✦

Ashing process for dry photolithography : Awatar Singh and W. S. Khokle. Microelectron. Reliab.24, 165 (1984)

Publisher: Elsevier Science
Year: 1985
Tongue: English
Weight: 123 KB
Volume: 25
Category: Article
ISSN: 0026-2714
DOI: 10.1016/0026-2714(85)90122-2

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An improved self-aligned silicide proces

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Simultaneous exposure and development technique for S.A.W. device fabrication : Awatar Singh. Microelectron. Reliab.23, 1165 (1984)

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