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Application of the simulator “XMAS” on specific problems in sub-half-micron lithography

✍ Scribed by H. Oertel; H. Betz; A. Heuberger

Publisher: Elsevier Science
Year: 1985
Tongue: English
Weight: 722 KB
Volume: 3
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(85)90049-8

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