## Abstract Secondary neutral mass spectrometry (SNMS) is a promising analytical technique for the characterization of thin films and bulk samples. We applied this technique to thin films used in VLSI technology. The samples investigated ranged from sputterβdeposited Al alloy films used as longβra
β¦ LIBER β¦
Application of secondary neutral mass spectrometry in low-energy sputtering yield measurements
β Scribed by S. Bhattacharjee; J. Zhang; V. Shutthanandan; P.K. Ray; N.R. Shivaparan; R.J. Smith
- Book ID
- 114169168
- Publisher
- Elsevier Science
- Year
- 1997
- Tongue
- English
- Weight
- 629 KB
- Volume
- 129
- Category
- Article
- ISSN
- 0168-583X
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
Applications of secondary neutral mass s
β
Mariano Anderle; Lorenza Moro
π
Article
π
1990
π
John Wiley and Sons
π
English
β 526 KB
Absolute depth profiling of thin film sy
β
A. Wucher; H. Oechsner; F. Novak
π
Article
π
1989
π
Elsevier Science
π
English
β 234 KB
Energy Distributions of Atoms Sputtered
β
Kunitomo, Shinta; Ono, Masahiro; Li, Chun Fei; Shimizu, Ryuichi
π
Article
π
1993
π
Institute of Pure and Applied Physics
π
English
β 565 KB
Angle-integrated yields of neutral clust
β
H. Gnaser; H. Oechsner
π
Article
π
1991
π
Elsevier Science
β 69 KB
Angle-integrated yields of neutral clust
β
H. Gnaser; H. Oechsner
π
Article
π
1991
π
Elsevier Science
π
English
β 511 KB
Auger electron spectroscopy in sputterin
π
Article
π
1976
π
Elsevier Science
π
English
β 137 KB
The advantages of ion etching over wet chemical etching are demonstrated, e,g. structure resolution in the region of the etching depth, no undercutting, excellent reproducibility and high adherence of small striplines.