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Application of secondary neutral mass spectrometry in low-energy sputtering yield measurements

✍ Scribed by S. Bhattacharjee; J. Zhang; V. Shutthanandan; P.K. Ray; N.R. Shivaparan; R.J. Smith


Book ID
114169168
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
629 KB
Volume
129
Category
Article
ISSN
0168-583X

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## Abstract Secondary neutral mass spectrometry (SNMS) is a promising analytical technique for the characterization of thin films and bulk samples. We applied this technique to thin films used in VLSI technology. The samples investigated ranged from sputter‐deposited Al alloy films used as long‐ra