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Auger electron spectroscopy in sputtering measurements: Application to low-energy Ar+ sputtering of Ag and Nb


Publisher
Elsevier Science
Year
1976
Tongue
English
Weight
137 KB
Volume
26
Category
Article
ISSN
0042-207X

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โœฆ Synopsis


The advantages of ion etching over wet chemical etching are demonstrated, e,g. structure resolution in the region of the etching depth, no undercutting, excellent reproducibility and high adherence of small striplines.


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The design of an ultrahigh vacuum magnetron sputtering apparatus with facilities for in sttu Auger electron spectroscopy (AES) measurements and plasma diagnostics is presented. It consists of three chambers. The sample can be moved under ultrahigh vacuum conditions from the sputtering chamber throug