Sputter cleaning of iron substrates and
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N. Eguchi; V. Grajewski; H.H. Uchida; E. Fromm
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Article
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1991
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Elsevier Science
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English
โ 411 KB
The design of an ultrahigh vacuum magnetron sputtering apparatus with facilities for in sttu Auger electron spectroscopy (AES) measurements and plasma diagnostics is presented. It consists of three chambers. The sample can be moved under ultrahigh vacuum conditions from the sputtering chamber throug