✦ LIBER ✦

Applications of secondary neutral mass spectrometry (SNMS) in VLSI technology

✍ Scribed by Mariano Anderle; Lorenza Moro

Publisher: John Wiley and Sons
Year: 1990
Tongue: English
Weight: 526 KB
Volume: 15
Category: Article
ISSN: 0142-2421
DOI: 10.1002/sia.740150905

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✦ Synopsis

Abstract

Secondary neutral mass spectrometry (SNMS) is a promising analytical technique for the characterization of thin films and bulk samples. We applied this technique to thin films used in VLSI technology.

The samples investigated ranged from sputter‐deposited Al alloy films used as long‐range interconnections, to silicide or silicide/polysilicon structures for gate interconnections, to dielectric films and doped silicon dioxide glasses used for insulation and passivation purposes. In all these samples the distribution of the elements was studied as a function of deposition and/or annealing conditions.

The SNMS results are compared with those obtained by more common analytical techniques, such as SIMS and nuclear analyses (RBS and nuclear reaction analysis). This comparison emphasizes the features of SNMS: good depth information, less sensitivity to matrix effects and optimum depth resolution.

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