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Application of scanning probe microscopy for the determination of the structural accuracy of high aspect ratio microstructures

✍ Scribed by S. Achenbach; J. Mohr; F.J. Pantenburg


Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
677 KB
Volume
53
Category
Article
ISSN
0167-9317

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✦ Synopsis


Deep X-ray lithography is a well known technique to fabricate microoptical systems. The performance of these systems, especially microspectrometers, strongly depends on the structural accuracy. To characterize the structural details of gratings of differently processed LIGA microspectrometers, we applied a high resolution atomic force microscope (Digital Instruments Dimension 3100). Structural details of the sidewall of the microspectrometer grating were evaluated by AFM measurements as a function of resist/developer parameters and the lateral and vertical location on the microstructure. The measurements revealed considerable differences in step heights and opening angles of the gratings. The results coincide with measurements of the optical performance of the differently processed spectrometers.


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