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Another Rate-Determining Step in the CVD of Copper

✍ Scribed by B.-M. Kim; H. H. Lee

Publisher: John Wiley and Sons
Year: 2001
Tongue: English
Weight: 301 KB
Volume: 7
Category: Article
ISSN: 0948-1907
DOI: 10.1002/1521-3862(200111)7:6<242::aid-cvde242>3.0.co;2-9

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✦ Synopsis

Fig. 1. Arrhenius plots of the deposition rate at three different precursor feed rates (W r ), total pressure 0.7 torr, argon carrier gas rate 100 sccm. Communications

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