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Anomalous strain relaxation in SiGe thin films and superlattices

✍ Scribed by LeGoues, F. K.; Meyerson, B. S.; Morar, J. F.

No coin nor oath required. For personal study only.

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SiGe has been utilized for aggressive CMOS technologies development recently and there are many references [M. Shima, T. Ueno, T. Kumise, H.