Effect of strain relaxation of oxidation-treated SiGe epitaxial thin films and its nanomechanical characteristics

✍ Scribed by Bo-Ching He; Hua-Chiang Wen; Tun-Yuan Chinag; Zue-Chin Chang; Derming Lian; Wei-Hung Yau; Wen-Fa Wu; Chang-Pin Chou

• Book ID: 103820061
• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 244 KB
• Volume: 256
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2009.12.022