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Anomalous depth profile of implanted fluorine ions in SiO2/Si

✍ Scribed by K Hanamoto; H Yoshimoto; T Hosono; A Hirai; Y Kido; Y Nakayama; R Kaigawa


Book ID
114170131
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
150 KB
Volume
140
Category
Article
ISSN
0168-583X

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