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Annealing of silicon implanted with arsine and hydrogen ions

✍ Scribed by Yokota, Katsuhiro ;Nakase, Shuusaku ;Nakamura, Kazuhiro ;Tannjou, Masayasu ;Matsuda, Kouji ;Takano, Hiromichi

Publisher: John Wiley and Sons
Year: 2003
Tongue: English
Weight: 81 KB
Volume: 195
Category: Article
ISSN: 0031-8965
DOI: 10.1002/pssa.200305920

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