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Annealing effects on residual stress of HfO2/SiO2 multilayers

✍ Scribed by Yanming Shen, 申雁鸣; Zhaoxia Han, 韩朝霞; Jianda Shao, 邵建达; Shuying Shao, 邵淑英; Hongbo He, 贺洪波

No coin nor oath required. For personal study only.

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