𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Annealing behavior of hydrogenated amorphous silicon—nitrogen alloy films prepared by sputtering

✍ Scribed by A. Morimoto; S. Oozora; M. Kumeda; T. Shimizu


Publisher
John Wiley and Sons
Year
1983
Tongue
English
Weight
351 KB
Volume
119
Category
Article
ISSN
0370-1972

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Laser annealing study of PECVD deposited
✍ U. Coscia; G. Ambrosone; F. Gesuele; V. Grossi; V. Parisi; S. Schutzmann; D.K. B 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 524 KB

The influence of carbon content on the crystallization process has been investigated for the excimer laser annealed hydrogenated amorphous silicon carbon alloy films deposited by Plasma Enhanced Chemical Vapour Deposition (PECVD) technique, using silane methane gas mixture diluted in helium, as well