✦ LIBER ✦

Preparation of hydrogenated amorphous silicon films by ion beam sputtering

✍ Scribed by Junji Saraie; Michiya Kobayashi; Yoshishisa Fujii; Hiroyuki Matsunami

Publisher: Elsevier Science
Year: 1981
Tongue: English
Weight: 549 KB
Volume: 80
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(81)90220-0

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Optical properties of thin amorphous sil

Optical properties of thin amorphous silicon and amorphous hydrogenated silicon films produced by ion beam techniques

✍ P.J. Martin; R.P. Netterfield; W.G. Sainty; D.R. McKenzie 📂 Article 📅 1983 🏛 Elsevier Science 🌐 English ⚖ 349 KB

Dual-ion-beam sputtering technique for t

Dual-ion-beam sputtering technique for the production of hydrogenated amorphous silicon

✍ S. Scaglione; C. Coluzza; D. Della Sala; L. Mariucci; A. Frova; G. Fortunato 📂 Article 📅 1984 🏛 Elsevier Science 🌐 English ⚖ 354 KB

Boron doping of amorphous hydrogenated s

Boron doping of amorphous hydrogenated silicon films prepared by r.f. sputtering

✍ D. Jousse; J. Saïd; J.C. Bruyère 📂 Article 📅 1985 🏛 Elsevier Science 🌐 English ⚖ 254 KB

Silicon nitride and oxynitride films pre

Silicon nitride and oxynitride films prepared by ion beam reactive sputtering

✍ V.A. Burdovitsin 📂 Article 📅 1983 🏛 Elsevier Science 🌐 English ⚖ 317 KB

Electrical and optical properties of ion

Electrical and optical properties of ion-beam- sputtered amorphous silicon-germanium alloy films

✍ Mohan Krishan Bhan; L.K. Malhotra; Subhash C. Kashyap 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 467 KB

Low-temperature preparation of ITO films

Low-temperature preparation of ITO films by dual ion beam sputtering

✍ Yoshifumi Suzaki; Tomokazu Shikama; Osamu Tanaka; Hiroshi Higuchi; Shigeaki Naka 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 148 KB 👁 2 views