Analysis of Variable-Range Hopping Conductivity in Si : P
✍ Scribed by M. Hornung; M. Iqbal; S. Waffenschmidt; H. v. Löhneysen
- Publisher
- John Wiley and Sons
- Year
- 2000
- Tongue
- English
- Weight
- 215 KB
- Volume
- 218
- Category
- Article
- ISSN
- 0370-1972
No coin nor oath required. For personal study only.
✦ Synopsis
The low-temperature electrical conductivity sT of uncompensated insulating Si:P with P concentration N just below the metal±insulator transition (MIT), i.e. 3X0 Â 10 18 cm À3 $ N $ 3X5 Â 10 18 cm À3 , was measured between 0.05 and 5 K. With decreasing N, sT shows a crossover from Mott variable-range hopping (VRH) to Efros-Shklovskii VRH. The data on the insulating side can be described by the universal phenomenological scaling function proposed by Aharony et al. From the N dependence of the Mott temperature T M a correlation-length exponent n 1X1 is obtained, compatible with the conductivity exponent m % 1X3 for metallic samples. Indeed, the data on both sides of the MIT can be combined to yield dynamic scaling of sNY T. Upon lowering N on the insulating side further, a change from Efros-Shklovskii VRH to simple activated conduction is observed near N % 2X7 Â 10 18 cm À3 . This is attributed to the activation from the lower to the upper Hubbard band, as inferred from a sign change in the thermoelectric power and the absence of such a feature in compensated Si:(P, B).
📜 SIMILAR VOLUMES
Isotopic mixtures of 70 Ge and 74 Ge (Isotopically Engineered: IE-Ge) were by a neutron-transmutation doping (NTD) process provided with a high compensation of K = N As /N Ga ffi 0.4, 0.6, 0.9. Variable range hopping (vrh) resistivity at T = 0.1-4.2 K shows r(T) = r 0 exp(T 0 /T) 1/2 . At K = 0.4-0.