Analysis of the linear regime of thermal oxidation of silicon in dry oxygen at atmospheric pressure and correlation with film properties

✍ Scribed by C. Pavelescu; C. Cobianu

• Publisher: Springer
• Year: 1986
• Tongue: English
• Weight: 241 KB
• Volume: 5
• Category: Article
• ISSN: 0261-8028
• DOI: 10.1007/bf01729399