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Analysis of carbon content and distribution in a-Si1−xCx:H films by resonant scattering

✍ Scribed by S.H. Sie; D.R. McKenzie; G.B. Smith; C.G. Ryan


Book ID
113277782
Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
343 KB
Volume
15
Category
Article
ISSN
0168-583X

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Hydrogenated amorphous SiC films (a-Si 1-x C x :H) were prepared by dc magnetron sputtering technique on p-type Si(1 0 0) and corning 9075 substrates at low temperature, by using 32 sprigs of silicon carbide (6H-SiC). The deposited a-Si 1-x C x :H film was realized under a mixture of argon and hydro