✦ LIBER ✦

An optimal neural network process model for plasma etching

✍ Scribed by Byungwhan Kim, ; May, G.S.

Book ID: 125472128
Publisher: IEEE
Year: 1994
Tongue: English
Weight: 977 KB
Volume: 7
Category: Article
ISSN: 0894-6507
DOI: 10.1109/66.286829

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