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An investigation of Si-SiO2and Si-Ta2O5interfaces prepared by reactive sputtering

✍ Scribed by Akiyama, K.; Ishihara, T.; Takemoto, T.; Terui, Y.

Book ID: 114589031
Publisher: IEEE
Year: 1966
Tongue: English
Weight: 203 KB
Volume: ED-13
Category: Article
ISSN: 0018-9383
DOI: 10.1109/t-ed.1966.15765

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