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An investigation of RF sputter etched silicon surfaces using helium ion backscatter

✍ Scribed by Glen W. Sachse; William E. Miller; Chris Gross

Publisher: Elsevier Science
Year: 1975
Tongue: English
Weight: 451 KB
Volume: 18
Category: Article
ISSN: 0038-1101
DOI: 10.1016/0038-1101(75)90045-3

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