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An etch-rate study of thermally annealed LTCVD SiO2films as a function of initial deposition conditions

✍ Scribed by C. Cobianu; C. Pavelescu

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

An etch rate study on thermally annealed

✍ C. Orfescu; C. Pavelescu; M. Badila 📂 Article 📅 1990 🏛 Springer 🌐 English ⚖ 274 KB

Variations in thermal SiO2 and buried Si

✍ K. Vanheusden; A. Stesmans 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 325 KB