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An etch rate study on thermally annealed SiO2films deposited in a TEOS-LPCVD system

✍ Scribed by C. Orfescu; C. Pavelescu; M. Badila

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

An etch-rate study of thermally annealed

✍ C. Cobianu; C. Pavelescu 📂 Article 📅 1984 🏛 Springer 🌐 English ⚖ 355 KB

Etch rate behaviour of SiO2 films chemic

✍ Irina Kleps; Cristian Pavelescu 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 220 KB