✦ LIBER ✦
Variations in thermal SiO2 and buried SiO2 formed by oxygen implantation revealed by chemical etch rates in HF solutions as a function of thickness
✍ Scribed by K. Vanheusden; A. Stesmans
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 325 KB
- Volume
- 12
- Category
- Article
- ISSN
- 0921-5107
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