Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. power

✍ Scribed by Rashid, Nur Maisarah Abdul; Ritikos, Richard; Othman, Maisara; Khanis, Noor Hamizah; Gani, Siti Meriam Ab.; Muhamad, Muhamad Rasat; Rahman, Saadah Abdul

• Book ID: 121490828
• Publisher: Elsevier Science
• Year: 2013
• Tongue: English
• Weight: 860 KB
• Volume: 529
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2012.09.032