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[American Vacuum Soc 1998 3rd International Symposium on Plasma Process-Induced Damage - Honolulu, HI, USA (4-5 June 1998)] 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) - Charging damage in thin gate-oxides-better or worse?

✍ Scribed by Cheung, K.P.; Liu, C.-T.; Chang, C.-P.; Colonell, J.I.; Lai, W.-Y.-C.; Pai, C.-S.; Vaidya, H.; Liu, R.; Clemens, J.T.; Hasegawa, E.

Book ID: 126656009
Publisher: American Vacuum Soc
Year: 1998
Weight: 404 KB
Category: Article
ISBN-13: 9780965157728
DOI: 10.1109/PPID.1998.725568

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