A transmission electron microscopy (TEM) study on the generation of stacking faults (SFs) and stacking fault (SF) induced inclusion during 3C-SiC growth by Continuous Feed Physical Vapour Transport (CF-PVT) method on 4H-SiC substrates is presented. A transition region of about 100 nm between the 4H-
AFM study of ridges in few-layer epitaxial graphene grown on the carbon-face of 4H–SiC
✍ Scribed by Gyan Prakash; Michael A. Capano; Michael L. Bolen; Dmitry Zemlyanov; Ronald G. Reifenberger
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 720 KB
- Volume
- 48
- Category
- Article
- ISSN
- 0008-6223
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✦ Synopsis
A characterization of the graphitic overlayer that forms on 4H-SiCð0 0 0 1Þ substrates heated for ten minutes to temperatures T > 1350 °C under vacuum conditions has been performed.
X-ray photoelectron spectroscopy of the C-face reveals the presence of graphitic carbon with a thickness that increases with growth temperature. Parallel atomic force microscope (AFM) studies find a mesh-like network of ridges with high curvature that bound atomically flat, tile-like facets of few-layer graphene (FLG). By imaging the network that develops on FLG, it is possible to map out the regions where the elastic energy is concentrated.
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We investigated the temperature dependence (1200-2100 1C) of morphological features in the growth of epitaxial graphene on 4H-SiC (0 0 0 À 1) C-face in ultra high vacuum (UHV). As a SiC initial surface preparation technique prior to the epitaxial graphene growth, Si-vapor etching was conducted to en