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Influence of the misorientation of 4H-SiC substrates on the morphology and crack formation in hetero epitaxial MOCVD grown GaN epilayers

✍ Scribed by M. Rudziński; P. R. Hageman; A. P. Grzegorczyk; L. Macht; T. C. Rödle; H. F. F. Jos; P. K. Larsen


Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
191 KB
Volume
2
Category
Article
ISSN
1862-6351

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