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Advanced colloidal lithography for sub-100 nm lift-off structures

โœ Scribed by Nico Homonnay; Nadine Geyer; Bodo Fuhrmann; Hartmut S. Leipner


Book ID
113940802
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
524 KB
Volume
86
Category
Article
ISSN
0042-207X

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Fabrication of sub-10-nm Auโ€“Pd structure
โœ F Lehmann; G Richter; T Borzenko; V Hock; G Schmidt; L.W Molenkamp ๐Ÿ“‚ Article ๐Ÿ“… 2003 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 494 KB

We report the fabrication of 6-nm Au-Pd structures using 30-keV e-beam lithography in a standard double-layer poly(methylmethacrylate) resist on silicon and subsequent lift-off. Line arrays with periods as small as 27 nm were realized. Details of the processing are presented and the dependence of th