Fabrication of sub-10-nm AuโPd structure
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F Lehmann; G Richter; T Borzenko; V Hock; G Schmidt; L.W Molenkamp
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Article
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2003
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Elsevier Science
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English
โ 494 KB
We report the fabrication of 6-nm Au-Pd structures using 30-keV e-beam lithography in a standard double-layer poly(methylmethacrylate) resist on silicon and subsequent lift-off. Line arrays with periods as small as 27 nm were realized. Details of the processing are presented and the dependence of th