Adhesion and stress of magnesium oxide thin films: Effect of thickness, oxidation temperature and duration

✍ Scribed by Sikandar H. Tamboli; Vijaya Puri; R.K. Puri

• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 641 KB
• Volume: 256
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2010.02.052

✦ Synopsis

Nanoscale magnesium oxide thin films have been deposited on glass substrate by thermal oxidation (in air) of vacuum evaporated magnesium films. X-ray diffraction (XRD) showed orientation along (2 0 0) and (2 2 0) directions. The mechanical properties of the MgO thin films were found to be the function of thickness (300, 450 and 600 nm), oxidation temperature (573, 623 and 673 K) and oxidation duration (90 and 180 min). As oxidation temperature and oxidation duration increases, adhesion and intrinsic stress were found to increase. Intrinsic stress decreased whereas adhesion increased due to increase in thin film thickness. The value of intrinsic stress was in range 28.902-73.212 (×10 7 N/m 2 ) and that of adhesion was 12.1-27.4 (×10 4 N/m 2 ) for the thin film of thickness 300 nm.