✦ LIBER ✦

Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask

✍ Scribed by Wang, Fan ;Wang, Xiangzhao ;Ma, Mingying ;Zhang, Dongqing ;Shi, Weijie ;Hu, Jianming

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Even aberration measurement of lithograp

✍ Peng, Bo ;Wang, Xiangzhao ;Qiu, Zicheng ;Cao, Yuting ;Duan, Lifeng 📂 Article 📅 2010 🏛 The Optical Society 🌐 English ⚖ 861 KB

Aberration-induced intensity imbalance o

✍ Peng, Bo; Wang, Xiangzhao; Qiu, Zicheng; Yuan, Qiongyan; Cao, Yuting 📂 Article 📅 2010 🏛 Optical Society of America 🌐 English ⚖ 274 KB

Measurement technique for in situ charac

✍ Wang, Fan ;Wang, Xiangzhao ;Ma, Mingying 📂 Article 📅 2006 🏛 The Optical Society 🌐 English ⚖ 662 KB

Evaluation and correction of aberrations

✍ Iemmi, Claudio; Moreno, Alfonso; Nicols, Josep; Campos, Juan 📂 Article 📅 2003 🏛 Optical Society of America 🌐 English ⚖ 290 KB

Diagnosing unknown aberrations in an ada

✍ Lee, David J.; Welsh, Byron M.; Roggemann, Michael C.; Ellerbroek, Brent L. 📂 Article 📅 1997 🏛 Optical Society of America 🌐 English ⚖ 635 KB

Sensitive measurement of photon lifetime

✍ Herbelin, J. M. ;McKay, J. A. ;Kwok, M. A. ;Ueunten, R. H. ;Urevig, D. S. ;Spenc 📂 Article 📅 1980 🏛 The Optical Society 🌐 English ⚖ 510 KB