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A Simple Model for Electron Diffusion Magnetothermopower

โœ Scribed by Blatt, F. J. ;Chiang, C. K. ;Smrcka, L.


Publisher
John Wiley and Sons
Year
1974
Tongue
English
Weight
589 KB
Volume
24
Category
Article
ISSN
0031-8965

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The class of continuous film-forming reactors used in the diffusion limited stages of polycondensation processes can be modeled approximately as a finite thickness slab in which reaction and simultaneous diffusion of the volatile by-product toward the free surface must be coupled with a step to acco