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A diffusion and reaction model for simple polycondensation

✍ Scribed by J.W. Ault; D.A. Mellichamp

Publisher
Elsevier Science
Year
1972
Tongue
English
Weight
732 KB
Volume
27
Category
Article
ISSN
0009-2509

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✦ Synopsis

The class of continuous film-forming reactors used in the diffusion limited stages of polycondensation processes can be modeled approximately as a finite thickness slab in which reaction and simultaneous diffusion of the volatile by-product toward the free surface must be coupled with a step to account for periodic mixing of the film. Solutions of the resulting partial differential equation model are shown to correlate adequately by a single algebraic equation over a wide range of values of the three independent parameters. Rearrangement of this "mixing film model" into an "efficiency factor" yields an expression for the importance of diffusional resistances in the reactor.

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