๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

A professional forum for the field of chemical vapor deposition

โœ Scribed by Prof. Michael Hitchman

Publisher
John Wiley and Sons
Year
1995
Tongue
English
Weight
360 KB
Volume
1
Category
Article
ISSN
0948-1907

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

A Thermodynamic Estimation of the Chemic
A Thermodynamic Estimation of the Chemical Vapor Deposition of Some Borides
โœ Pavel Peshev ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 164 KB

The temperature dependencies of the change in Gibbs energy for a series of probable reactions of chemical vapor deposition (CVD) of TiB 2 , ZrB 2 , NbB 2 , TaB 2 , and LaB 6 using BCl 3 , BBr 3 , B 2 H 6 , B 5 H 9 , and B 10 H 14 as boron sources have been plotted on the basis of thermodynamic data

Laboratory batch reactor method for kine
Laboratory batch reactor method for kinetic study of chemical vapor deposition
โœ Carol M. McConica; David A. Bell; Kevin L. Baker; Devin Moss ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› American Institute of Chemical Engineers ๐ŸŒ English โš– 713 KB

A lab-scale nonflowing reactor was built to study chemical vapor deposition reactions. Mass spectrometry is used to follow reaction pathways and to determine instantaneous reaction rates throughout film growth. In each experiment, the kinetic rate dependence on concentration for a wide range of conc