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A PNPN tunnel field-effect transistor with high- k gate and low- k fringe dielectrics

✍ Scribed by Cui, Ning; Liang, Renrong; Wang, Jing; Zhou, Wei; Xu, Jun


Book ID
120493101
Publisher
IOP Publishing
Year
2012
Tongue
English
Weight
399 KB
Volume
33
Category
Article
ISSN
1674-4926

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This paper reports on the processing and the characterization of pentacene organic field effect transistors (OFETs) with a two-layer gate dielectric consisting of a polymer (PMMA) on a high-k oxide (Ta 2 O 5 ). This dielectric stack has been designed in view to combine low voltage operating devices,