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A plasma source for the production of thin oxide films

✍ Scribed by M. Hecq; J. van Cakenberghe

Book ID: 107859859
Publisher: Elsevier Science
Year: 1972
Tongue: English
Weight: 158 KB
Volume: 12
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(72)90112-5

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